Central and Minimum Elastohydrodynamic Film Thickness at High Contact Pressure

[+] Author and Article Information
M. Smeeth, H. A. Spikes

Department of Mechanical Engineering, Imperial College of Science, Technology, and Medicine, Exhibition Road, London, SW7 2BX, England

J. Tribol 119(2), 291-296 (Apr 01, 1997) (6 pages) doi:10.1115/1.2833204 History: Received February 09, 1996; Revised June 12, 1996; Online January 24, 2008


A new optical technique has been developed which is able to obtain accurate film thickness profiles across elastohydrodynamic (EHD) contacts. This has been used in conjunction with a high pressure EHD test rig to obtain both central and minimum EHD film thicknesses at high contact pressures up to 3.5 GPa. The results have been compared with the classical film thickness equations of Hamrock and Dowson and also with recent high pressure computations due to Venner. It is found that minimum film thickness falls more rapidly with applied load at high than at low contact pressures, with a film thickness/load exponent of −0.3. This confirms the findings of recent high pressure computational EHD modeling.

Copyright © 1997 by The American Society of Mechanical Engineers
Your Session has timed out. Please sign back in to continue.





Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging and repositioning the boxes below.

Related Journal Articles
Related eBook Content
Topic Collections

Sorry! You do not have access to this content. For assistance or to subscribe, please contact us:

  • TELEPHONE: 1-800-843-2763 (Toll-free in the USA)
  • EMAIL: asmedigitalcollection@asme.org
Sign In