Effect of Stress State of Different Tin Films on Their Tribological Behavior

[+] Author and Article Information
Zhuang Daming, Liu Jiajun, Zhu Baoliang

Tsingtiua University, 100084 Beijing, Peoples’ Republic of China

Zhou Zhong-Rong

Southwest Jiaotong University, 610031 Chengdu, Peoples’ Republic of China

Leo Vincent, Philippe Kapsa

Ecole Centrale de Lyon, 69131 Ecully Cedex, France

J. Tribol 120(4), 820-828 (Oct 01, 1998) (9 pages) doi:10.1115/1.2833785 History: Received October 28, 1996; Revised September 10, 1997; Online January 24, 2008


Titanium nitride films were deposited by the methods of ion beam enhanced deposition (IBED), plasma chemical vapor deposition (PCVD) and ion plating (IP). X-ray diffraction analysis was employed to determine the internal stress state of TiN film and 52100 steel substrate at both sides of the interface. The effect of stress state on their bonding strength and tribological behavior was analyzed systematically, their wear and failure mechanisms were discussed in detail as well.

Copyright © 1998 by The American Society of Mechanical Engineers
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