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TECHNICAL PAPERS

Nanotribological and Nanomechanical Properties of Ultrathin Amorphous Carbon Films Synthesized by Radio Frequency Sputtering

[+] Author and Article Information
W. Lu, K. Komvopoulos

Fellow ASME   Department of Mechanical Engineering, University of California, Berkeley, CA 94720

J. Tribol 123(3), 641-650 (Oct 31, 2000) (10 pages) doi:10.1115/1.1339977 History: Received May 01, 2000; Revised October 31, 2000
Copyright © 2001 by ASME
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References

Figures

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Schematic of the surface force microscope
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(a) Substrate contribution to the compliance of the film/substrate composite medium and (b) ratio of effective hardness to film hardness versus ratio of nanoindentation (contact) depth to film thickness of different a-C films
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Friction coefficient versus lateral displacement for a 20 μm radius diamond tip slid on an a-C film surface under a contact load of (a) 50 μN, (b) 100 μN, (c) 200 μN, and (d) 400 μN
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Average friction coefficient versus H(1−v2)/(σE) for a 20 μm radius diamond tip slid on different a-C films under a contact load of (a) 50 μN, (b) 100 μN, (c) 200 μN, and (d) 400 μN
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Friction coefficient versus contact load for a 20 μm radius diamond tip slid on elastically deformed a-C films. The inset table gives the effective hardness, effective hardness-to-effective elastic modulus ratio, and surface roughness of each film.
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Surface images of a-C films scratched by a 20 μm radius diamond tip under different contact loads: (a) film #27, (b) film #10, (c) film #15, and (d) film #20
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Friction coefficient versus contact load for a 20 μm radius diamond tip slid on plastically deformed a-C films. The inset table gives the effective hardness, effective hardness-to-effective elastic modulus ratio, and surface roughness of each film.
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Effective hardness-to-effective elastic modulus ratio versus effective hardness
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Surface images of an a-C film (film #28) scratched by (a) a 100 nm radius diamond tip under a contact load of 5 and 10 μN, and (b) a 20 μm radius diamond tip under a contact load in the range of 50–400 μN
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Wear rate versus H(1−v2)/(σE) for a 100 nm radius diamond tip and a 10 μN contact load
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Wear depth for the first wear cycle as a function of (a) H(1−v2)/(σE) and (b) film surface roughness for a 100 nm radius diamond tip and a 10 μN contact load
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Wear patterns on different a-C film surfaces generated after the first wear cycle with a 100 nm radius diamond tip under a 10 μN contact load. The a-C films were deposited in 5 min at RF power of 750 W, working pressure of 3 mTorr, and substrate bias voltage of (a) 0 V (film #15), (b) −100 V (film #16), (c) −200 V (film #17), and (d) −300 V (film #19).
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Wear depth versus number of wear cycles for a 100 nm radius diamond tip and a 10 μN contact load. The a-C films were deposited in 5 min at RF power of 750 W, working pressure of 3 mTorr, and substrate bias voltage of 0 V (film #15), −100 V (film #16), −200 V (film #17), and −300 V (film #19).
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Wear depth versus number of wear cycles for a 10 nm thick a-C film and different contact loads. The a-C film was deposited in 5 min at RF power of 750 W, working pressure of 3 mTorr, and substrate bias voltage of −200 V (film #17).

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