0
TECHNICAL NOTES

Soft Elastohydrodynamic Lubrication With Roughness

[+] Author and Article Information
Andrew T. Kim

Department of Mechanical, Aerospace, and Nuclear Engineering, Focus Center—New York, Rensselaer: Interconnections for Gigascale Integration, Rensselaer Polytechnic Institute, Troy, NY 12180-3590  

Jongwon Seok, John A. Tichy

Department of Mechanical, Aerospace, and Nuclear Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180-3590  

Timothy S. Cale

Focus Center—New York, Rensselaer: Interconnections for Gigascale Integration, Rensselaer Polytechnic Institute, Troy, NY 12180-3590

J. Tribol 125(2), 448-451 (Mar 19, 2003) (4 pages) doi:10.1115/1.1494100 History: Received January 22, 2002; Revised May 16, 2002; Online March 19, 2003
Copyright © 2003 by ASME
Your Session has timed out. Please sign back in to continue.

References

Shan,  L., Levert,  J., Meade,  L., Danyluk,  S., and Tichy,  J. A., 2000, “Interfacial Fluid Mechanics and Pressure Prediction in Chemical Mechanical Polishing,” ASME J. Tribol., 122(3), pp. 539–543.
Tichy,  J. A., Levert,  J., Shan,  L., and Danyluk,  S., 1999, “Contact Mechanics and Lubrication Hydrodynamics of Chemical Mechanical Polishing,” J. Electrochem. Soc., 146, pp. 1523–1528.
Tseng,  W., Wang,  Y., and Chin,  J., 1999, “Effects of Film Stress on the Chemical Mechanical Polishing Process,” J. Electrochem. Soc., 146, pp. 4273–4280.
Liang,  H., Kaufman,  F., Sevilla,  R., and Anjur,  S., 1997, “Wear Phenomena in Chemical Mechanical Polishing,” Wear, 211, pp. 271–279.
Hamrock, B. J., 1994, Fundamentals of Fluid Film Lubrication, McGraw-Hill.
Harp,  S. R., and Salant,  R. F., 2001, “An Average Flow Model of Rough Surface Lubrication with Inter-Asperity Cavitation,” ASME J. Tribol., 123(1), pp. 134–142.
Greenwood,  J. A., and Williamson,  J. B. P., 1966, “Contact of Nominally Flat Rough Surfaces,” Proc. R. Soc. London, Ser. A, 295, pp. 300–319.
Johnson, K. L., 1985, Contact Mechanics, Cambridge University Press, Cambridge, UK.
Runnels,  S. R., and Eyman,  L. M., 1994, “Tribology Analysis of Chemical-Mechanical Polishing,” J. Electrochem. Soc., 141, pp. 1698–1701.

Figures

Grahic Jump Location
Schematic of a rigid flat surface in contact with a moving soft compliant pad
Grahic Jump Location
Schematic of asperities on a rough compliant surface contact with a rigid flat
Grahic Jump Location
Total, asperity and bulk pad displacement distribution for sample conditions: total displacement (–), asperity displacement (__), and bulk pad displacement ([[dashed_line]])
Grahic Jump Location
Effective film thickness distribution h(x) for sample conditions
Grahic Jump Location
Contact asperity and pad stress and fluid pressure distribution: asperity stress ([[dashed_line]]), bulk pad stress (–), and fluid pressure (__)
Grahic Jump Location
Solid contact force and fluid force for tilt angle for α=20 μrad: asperity force ([[dashed_line]]), externally applied force (–), and fluid force (__)

Tables

Errata

Discussions

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging and repositioning the boxes below.

Topic Collections

Sorry! You do not have access to this content. For assistance or to subscribe, please contact us:

  • TELEPHONE: 1-800-843-2763 (Toll-free in the USA)
  • EMAIL: asmedigitalcollection@asme.org
Sign In