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Article

Wear Mechanisms of Untreated and Gamma Irradiated Ultra-High Molecular Weight Polyethylene for Total Joint Replacements

[+] Author and Article Information
J. Zhou, K. Komvopoulos

Department of Mechanical Engineering, University of California, Berkeley, CA 94720

J. Tribol 127(2), 273-279 (Apr 07, 2005) (7 pages) doi:10.1115/1.1828079 History: Received February 16, 2004; Revised June 23, 2004; Online April 07, 2005
Copyright © 2005 by ASME
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References

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Figures

Grahic Jump Location
Coefficient of friction versus sliding distance of (a) untreated (control), (b) 3 Mrad, (c) 6 Mrad, and (d) 10 Mrad UHMWPE sliding against Co–Cr alloy in bovine serum preserved with 0.1 wt % sodium azide. (The error bars indicate one standard deviation above and below the corresponding mean values.)
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Wear factor of UHMWPE versus gamma irradiation dose. (The error bars indicate one standard deviation above and below the corresponding mean values.)
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ESEM images showing (a) fine wear debris and micropitting on the worn surface of the 3 Mrad UHMWPE and (b) microcracking on the worn surface of the 10 Mrad UHMWPE. (The arrows indicate the sliding direction.)
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TEM images of untreated UHMWPE showing (a) randomly distributed crystalline lamellae in the amorphous matrix of the original microstructure and (b) alignment of the majority of the molecular chains parallel to the surface due to sliding. [The arrow in (b) indicates the sliding direction.]
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ESEM micrographs showing regularly spaced folds on the worn surfaces of (a) untreated, (b) 3 Mrad, (c) 6 Mrad, and (d) 10 Mrad UHMWPE. (The arrows indicate the sliding direction.)
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Wear resistance versus reciprocal of fold spacing of untreated and gamma irradiated UHMWPE. (The error bars indicate one standard deviation above and below the corresponding mean values.)
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SEM micrographs of the 3 Mrad UHMWPE obtained after etching: (a) original surface showing randomly distributed crystalline domains, (b) lamellae structures in crystalline regions revealed after etching the amorphous phase, (c) worn surface showing the formation of regularly spaced and parallel folds and etch holes in the regions between folds, and (d) lamellae exposure at the crests of etched folds indicating a higher lamellae concentration in the folds.
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Schematic illustration of the deformation process leading to the formation of regularly spaced and parallel folds on UHMWPE sliding surfaces: (a) original microstructure with randomly distributed crystalline lamellae, (b) surface folding due to plastic shear and lamellae alignment adjacent to the surface, and (c) lamellae at the crests of folds revealed after etching the amorphous phase.

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