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Technical Brief

Cavitation Erosion Resistance of Sputter-Deposited Cr3Si Film on Stainless Steel

[+] Author and Article Information
Shuyun Jiang

School of Mechanical Engineering,
Southeast University,
Nanjing 211189, China
e-mail: jiangshy@seu.edu.cn

Hongqin Ding

School of Mechanical Engineering,
Southeast University,
Nanjing 211189, China

Jiang Xu

Department of Material Science and Engineering,
Nanjing University of Aeronautics and Astronautics,
Nanjing 210016, China;
School of Mechanical and Electrical Engineering,
Wuhan Institute of Technology,
693 Xiongchu Avenue,
Wuhan 430073, China

1Corresponding author.

Contributed by the Tribology Division of ASME for publication in the JOURNAL OF TRIBOLOGY. Manuscript received August 24, 2015; final manuscript received January 20, 2016; published online June 23, 2016. Assoc. Editor: Satish V. Kailas.

J. Tribol 139(1), 014501 (Jun 23, 2016) (5 pages) Paper No: TRIB-15-1310; doi: 10.1115/1.4033049 History: Received August 24, 2015; Revised January 20, 2016

In this technical brief, a Cr3Si nanocrystalline film was deposited on 304 stainless steel (SS) substrate using a double glow discharge plasma technique. The film was characterized by X-ray diffraction, scanning electron microscopy (SEM), transmission electron microscopy, nanohardness tester, and scratch tester. The as-deposited film with a thickness of 5 μm consisted of A15 structured Cr3Si phase with an average grain size of 8 nm. The hardness values of the film were determined to be 26 GPa, which was ten times greater than 304 SS. A self-designed ultrasonic vibration cavitation erosion apparatus was employed to evaluate the cavitation erosion resistance of the Cr3Si film. The results showed that after cavitation tests of 30 hrs, the erosion mass loss of the film was only 60% of that for 304 SS substrate. SEM observation of the erosion surfaces indicated that the surface damage degree of the Cr3Si film is significantly less than that of 304 SS.

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Figures

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Fig. 1

(a) The ultrasound vibration system—photo, (b) The ultrasound vibration system—schematic diagram of system, and (c) The ultrasound vibration system—schematic diagram of specimen placement

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Fig. 2

Cross section SEM morphology of the as-deposited Cr3Si film

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Fig. 3

(a) TEM brighttield micrograph and HRTEM image of the sputter-deposited nanocrystalline Cr3Si film—TEM brighttield micrograph and (b) TEM brighttield micrograph and HRTEM image of the sputter-deposited nanocrystalline Cr3Si film—HRTEM image

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Fig. 4

XRD pattern of the sputter-deposited Cr3Si film

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Fig. 5

(a) The acoustic signal intensity versus load plot and SEM image of the scratch track on Cr3Si film—the acoustic signal intensity versus load plot. (b) The acoustic signal intensity versus load plot and SEM image of the scratch track on Cr3Si film—SEM image of the scratch track on Cr3Si film.

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Fig. 6

(a) Specimens after 30 hrs of cavitation test—304 steel and (b) specimens after 30 hrs of cavitation test—Cr3Si film

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Fig. 7

(a) The test curves of Cr3Si film and 304 steel—mass loss and (b) The test curves of Cr3Si film and 304 steel—MDE

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Fig. 8

(a) The SEM images of the specimen after 30 hrs test—304 SS and (b) The SEM images of the specimen after 30 hrs test—Cr3Si film

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Fig. 9

(a) Failure behaviors of the Cr3Si film—the pit by brittle fracture and (b) failure behaviors of the Cr3Si film—the pit by grain spalling

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