Effect of High Energy Ion Bombardment on the Tribological Properties of WS2 Sputtered Films

[+] Author and Article Information
Motohisa Hirano, Shojiro Miyake

NTT Applied Electronics Laboratories, Midori-cho, Musashino-shi, Tokyo 180, Japan

J. Tribol 110(4), 621-627 (Oct 01, 1988) (7 pages) doi:10.1115/1.3261703 History: Received November 27, 1987; Online October 29, 2009


An attempt was made to improve the tribological properties of WS2 sputtered film by bombarding the film surface with various inert gaseous ions (He+ , Ar+ , Kr+ , Xe+ ). The resulting changes in tribological properties were investigated together with related changes in physical properties such as morphology and crystallinity of the films. Bombardment by He+ and Ar+ effectively reduces WS2 film friction, whereas Kr+ – and Xe+ – bombardment increased WS2 film friction. The effect of high-energy ion bombardment is discussed in relation to the crystallinity of WS2 film.

Copyright © 1988 by ASME
Topics: Tribology , Friction , Ions
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